Laurell Manual Resist Spinner
Laurell Manual Resist Spinner
Laurell Technologies - WS-650
nano@stanford
Stanford University
Stanford Nanofabrication Facility
- Thin Film Processing
- Polymer
- Spin Coating
Description
The Laurell Coater is used to apply photoresist to any substrate. Centrifugal force uniformly spreads fluid across the surface of the spinning substrate. The spin speed, spin time, and substrate and fluid properties determine the final thickness of the film.
Maximum Substrate Size
6 inch