Laurell Develop-Etch
Laurell Develop-Etch
Laurell - WS1000-MH
nano@stanford
Stanford University
Stanford Nanofabrication Facility
- Etching
- Wet
- Wet Bench
Description
This Laurell is designed for developing and chrome etching for mask-making. However, the configuration and programming are flexible to allow for controlled dispensing and rinsing of a variety of solutions.
Maximum Substrate Size
8 inch