Lam Research TCP 9400 Poly Etcher
Lam Research TCP 9400 Poly Etcher
Lam Research Corporation - TCP 9400
nano@stanford
Stanford University
Stanford Nanofabrication Facility
- Etching
- Dry
- ICP
Description
The LAM 9400 etcher is a high-density, plasma system used for etching polysilicon, silicon, and germanium films. It can also be used for etching silicon nitride. This system is plumbed with chlorine, BCl3, C2F6 and SF6.
Maximum Substrate Size
4 inch
Comments
TCP system