Lam Rainbow 4400 RIE
Lam Rainbow 4400 RIE
Lam Research - Rainbow 4400
SENIC
Joint School of Nanoscience and Nanoengineering
Joint School of Nanoscience and Nanoengineering
- Etching
- Dry
- RIE
Description
This tool is primarily used for silicon, oxide and nitride etching using SF6 and CF4 based gas chemistry
Maximum Substrate Size
8 inch