Karl Suss MA-6 Contact Aligner 1&2
Karl Suss MA-6 Contact Aligner 1&2
Suss Microtech - MA6
nano@stanford
Stanford University
Stanford Nanofabrication Facility
- Lithography
- All Lithography
- UV
Description
The Karl Suss MA-6 Contact Aligner system can perform precision mask-to-wafer front- or back-side alignment and near-UV photoresist exposure in hard- and soft- contact, as well as high and low vacuum contact; proximity mode is not available. Accommodates 3", 4" and 6" wafers and pieces.
Maximum Substrate Size
4 inch