JEOL Electron Beam Lithography
JEOL Electron Beam Lithography
JEOL - JBX-6000 FS/E
NCI-SW
Arizona State University
ASU NanoFab
- Lithography
- All Lithography
- EBL
Description
Electron beam lithography
Maximum Substrate Size
8 inch
Comments
20 nm resolution, 60 nm overlay