JEOL 6300
JEOL 6300
JEOL - JBX-6300
CNF
Cornell University
Cornell NanoScale Science & Technology Facility (CNF)
- Lithography
- All Lithography
- EBL
Description
The 6300 is a high speed, high resolution commercial ebeam lithography system operating at 100KV. The unique capability of the JEOL 6300 is that a fifth lens can be used to get a smaller beam spot size and write sub-10 nm features. This is the high resolution writing mode. Writing without the 5th lens in 4th lens mode is called the high speed writing mode.
Maximum Substrate Size
6 inch