IPE Plasma enhanced chemical vapor deposition system
IPE Plasma enhanced chemical vapor deposition system
IPE - PECVD
MANTH
University of Pennsylvania
Singh Center for Nanotechnology
- Thin Film Processing
- Dielectric
- PECVD
Description
This non-load-locked system is dedicated to depositing dielectric films at low temperatures for a variety of substrates, including plastics.
Maximum Substrate Size
8 inch