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I-Line Lithography - GCA 8500DSW Stepper

I-Line Lithography - GCA 8500DSW Stepper

GCA - 8500DSW

RTNN North Carolina State University NCSU Nanofabrication Lab (NNF)
  • Lithography
    • All Lithography
      • Other
Description
The GCA AutoStep 200 stepper has a 21mm lens with 5x reduction and a numerical Aperture (NA) of 0.45, and uses a mercury arc lamp with a wavelength of 365nm. It is capable of exposing 2", 3",4",6" and 8" wafers as well as piece parts down to 5mm square. T stepper has the capability of printing down to 0.5 microns.  It has an automatic wafer handler that can be used for 6" wafers. The quartz reticles used in the stepper are 5"x 5" and 0.09" thick.
Maximum Substrate Size
8 inch
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