Heildelberg MLA 150 - 2
Heildelberg MLA 150 - 2
Heidelberg - MLA150
nano@stanford
Stanford University
Stanford Nanofabrication Facility
- Lithography
- All Lithography
- UV
Description
Heidelberg is a direct-write photolithography system. Heidelberg 2 has a i-line laser with the high-aspect-ratio module. The minimum feature size is about 0.5 microns.
Maximum Substrate Size
6 inch