Heildelberg MLA 150 - 1
Heildelberg MLA 150 - 1
Heidelberg - MLA150
nano@stanford
Stanford University
Stanford Nanofabrication Facility
- Lithography
- All Lithography
- UV
Description
Heidelberg is a direct-write photolithography system. Heidelberg 1 has a g-line laser, backside align capability, and the gray-scale write module. The minimum feature size is about 1 micron.
Maximum Substrate Size
6 inch