Heidelberg MLA150 No.1 (375/405)
Heidelberg MLA150 No.1 (375/405)
Heidelberg - MLA 150
SENIC
Georgia Tech
Institute for Electronics and Nanotechnology Micro/Nano Fabrication Facility
- Patterning
- All Patterning
- Laser
Description
The MLA150 has been specifically designed for easy operation maskless lithography system. It offers all the capabilities that are required for single layer and multi-layer applications and because the MLA150 exposures are always non-contact it will even overcome some of the limitations of photomask based exposure technologies.
Exposing an area of 100x100 mm² with structures as small as 1 micron will take less than 10 minutes – independent of the fill factor or number of structures within this area. Alignment in multi-layer applications is achieved within 2 minutes by using three integrated cameras with varying resolution. Layer to layer alignment accuracy is better than 500 nm and does not depend on the operator’s level of training.
Exposing an area of 100x100 mm² with structures as small as 1 micron will take less than 10 minutes – independent of the fill factor or number of structures within this area. Alignment in multi-layer applications is achieved within 2 minutes by using three integrated cameras with varying resolution. Layer to layer alignment accuracy is better than 500 nm and does not depend on the operator’s level of training.
Maximum Substrate Size
6 inch