Heidelberg Laser Writer
Heidelberg Laser Writer
Heidleberg Instruments - DWL 66+
MANTH
University of Pennsylvania
Singh Center for Nanotechnology
- Lithography
- All Lithography
- Mask Making
Description
365 nm laser writer capable of writing on photomasks and wafers.
9 in x 9 in stage
multiple write heads - resolution 0.6 um with 2 mm head ; 2um with 10mm head; 10 um with 40 mm head
alignment capable for direct-write on wafers. Grid as small as 10 nm and alignment accuracy as small as 100 nm.
9 in x 9 in stage
multiple write heads - resolution 0.6 um with 2 mm head ; 2um with 10mm head; 10 um with 40 mm head
alignment capable for direct-write on wafers. Grid as small as 10 nm and alignment accuracy as small as 100 nm.
Maximum Substrate Size
8 inch