Glen 1000 Resist Strip
Glen 1000 Resist Strip
YES - Glen 1000
CNF
Cornell University
Cornell NanoScale Science & Technology Facility (CNF)
- Cleaning
- All Cleaning
- Plasma/Stripper
Description
he Glen 1000 system utilizes a oxygen plasma source for stripping of photoresist and other organics. The tool can be setup to give direct ion bombardment or in a downstream ion mode for lower surface damage.
Maximum Substrate Size
8 inch