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Flexible Corrosive Wetbench and GaAs

Flexible Corrosive Wetbench and GaAs

WAFAB International

nano@stanford Stanford University Stanford Nanofabrication Facility
  • Etching
    • Wet
      • Wet Bench
Description
Wet Benches wbflexcorr-1, -2, and -3 are for wet chemical (corrosives) processing of standard and non-standard materials (flexible) like glass with gold or non-standard metals for pieces and wafers up to 6 inch. This station contains one hot plate for heating acids or bases in beakers, separate drain for HF waste disposal, two 6 inch quartz-lined hot pots for acids or bases, one 4 inch quartz-lined hot pot for 90% sulfuric acid/hydrogen peroxide (piranha) clean, dump rinser, DI water sink, and there is room for manual processing in beakers.
Maximum Substrate Size
6 inch
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