Flexible Corrosive Wetbench and GaAs
Flexible Corrosive Wetbench and GaAs
WAFAB International
nano@stanford
Stanford University
Stanford Nanofabrication Facility
- Etching
- Wet
- Wet Bench
Description
Wet Benches wbflexcorr-1, -2, and -3 are for wet chemical (corrosives) processing of standard and non-standard materials (flexible) like glass with gold or non-standard metals for pieces and wafers up to 6 inch. This station contains one hot plate for heating acids or bases in beakers, separate drain for HF waste disposal, two 6 inch quartz-lined hot pots for acids or bases, one 4 inch quartz-lined hot pot for 90% sulfuric acid/hydrogen peroxide (piranha) clean, dump rinser, DI water sink, and there is room for manual processing in beakers.
Maximum Substrate Size
6 inch