Fiji Atomic Layer Deposition
Fiji Atomic Layer Deposition
Ultratech - Fiji
nano@stanford
Stanford University
Stanford Nanofabrication Facility
- Thin Film Processing
- Dielectric
- ALD
Description
Fiji3 is a plasma-enabled atomic layer deposition (ALD) system from Cambridge Nanotech, now Ultratech. Its use is largely limited deposition of certain metal oxide films.
Maximum Substrate Size
8 inch
Comments
Deposits metal films as well