Fiji Atomic Layer Deposition
Fiji Atomic Layer Deposition
Ultratech - Fiji
nano@stanford
Stanford University
Stanford Nanofabrication Facility
- Thin Film Processing
- Dielectric
- ALD
Description
Fiji1 and 2 are load-locked, plasma-enabled, atomic layer deposition (ALD) systems from Cambridge Nanotech, now Ultratech. Fiji1 is used for deposition of various dielectric and metallic films. Fiji2 is used for thermal and plasma assisted deposition of various dielectric and metallic films. The systems can accommodate pieces up to an 8" wafer.
Maximum Substrate Size
8 inch
Comments
Deposits metal films as well