EVG 620 Mask Aligner
EVG 620 Mask Aligner
EVG Group - EVG620
SENIC
Georgia Tech
Institute for Electronics and Nanotechnology Micro/Nano Fabrication Facility
- Lithography
- All Lithography
- UV
Description
The EVG 620 Mask aligner is configured for top and backside alignment. It has a manual cassette load with UV400 exposure optics (365nm) and 10x objective lens. The alignment stage design achieves highly accurate alignment and exposure results while maintaining high throughput.