Drytek 100 Plasma Etcher
Drytek 100 Plasma Etcher
Drytek - Drytek 100
nano@stanford
Stanford University
Stanford Nanofabrication Facility
- Etching
- Dry
- RIE
Description
The Drytek2 plasma etcher uses freon-based chemistry for etching various Si, polysilicon, nitride, tungsten, tungsten silicide films.
Maximum Substrate Size
4 inch