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Denton Discovery 635 Sputter System

Denton Discovery 635 Sputter System

Denton Vacuum - Discovery 635

SDNI University of California, San Diego Nano3 Cleanroom Facility
  • Thin Film Processing
    • Metal
      • Sputter
Description
The Denton Discovery 635 is a three cathode (one RF, two DC) sputter system for deposition of metals and dielectrics. The system is capable of RF bias for pre-deposition cleaning and descum. Stage can heat up to 450C. Nano3 supplies a wide variety of sputter targets for use. Available process gases: Ar, O2, N2.
Maximum Substrate Size
6 inch
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