CVC DC Sputterer
CVC DC Sputterer
SENIC
Georgia Tech
Institute for Electronics and Nanotechnology Micro/Nano Fabrication Facility
- Thin Film Processing
- Metal
- Sputter
Description
The CVC DC sputterer is used to coat samples with metals. Specifications: -wafers/substrates up to 6" -new touchscreen control system -two 3" and two 8" sputter guns -rotostrate for improved uniformity -base pressure 5e-6 Torr
Maximum Substrate Size
6 inch