CPK Spin Developer/Etch Bench
CPK Spin Developer/Etch Bench
CPK
KY Multiscale
University of Louisville
Micro Nano Technology Center (MNTC)
- Lithography
- All Lithography
- Resist Processing
Description
Spinner based system for MF-319 based photolithographic development and chromium etching. This system is capable of processing 4", 6" and 8" wafers and 4", 5", 7" and 9" masks.