CMOS Spin Rinse Dryer (SRD) - Pettit
CMOS Spin Rinse Dryer (SRD) - Pettit
Semitool -
SENIC
Georgia Tech
Institute for Electronics and Nanotechnology Micro/Nano Fabrication Facility
- Cleaning
- All Cleaning
- Spin Rinse Drying
Description
The spin-rinse-dryer is equipped for cleaning 4-inch silicon wafers. It spins the wafers and uses deionized water and nitrogen to clean and dry the wafers.
Maximum Substrate Size
4 inch