CMOS Cleaning Station (Marcus)
CMOS Cleaning Station (Marcus)
SENIC
Georgia Tech
Institute for Electronics and Nanotechnology Micro/Nano Fabrication Facility
- Cleaning
- All Cleaning
- Wet Bench
Description
This fume hood has heated tanks: Piranha, SC2 cleans and dilute HF etch tank. These wet baths are only available for use for CMOS-qualified processes with approved process flows. Only 4" and 6" wafers are allowed in this system.
Maximum Substrate Size
6 inch