CCI HD Optical Profiler
CCI HD Optical Profiler
Taylor Hobson - CCI HD
CNS
Harvard University
Center for Nanoscale Systems (CNS)
- Metrology/Characterization
- Structure or Device
- Profilometry
Description
This advanced optical profiler uses Coherence Correlation Interferometry (CCI) to generate high resolution 3D non contact surface measurements. The Taylor Hobson CCI optical profiler system uses technology capable of providing surface roughness and step-height measurements with sub-nanometer precision. A useful extension to the CCI is the ability to easily measure films thicker than 1.5 _m, but thinner films are difficult to measure.
A solution to the thickness limitation is the Helical Complex Field (HCF) function. The ability to obtain sub-nanometer vertical resolution and sub-micron lateral resolution allows rapid, non-destructive, and highly repeatable measurements of metal, polymer, and semiconductor thin films serving a variety of applications involving solar PV, MEMS, optics, and coatings technology.
A solution to the thickness limitation is the Helical Complex Field (HCF) function. The ability to obtain sub-nanometer vertical resolution and sub-micron lateral resolution allows rapid, non-destructive, and highly repeatable measurements of metal, polymer, and semiconductor thin films serving a variety of applications involving solar PV, MEMS, optics, and coatings technology.