Atomic Layer Deposition
Atomic Layer Deposition
Ultratech - Fiji 200Gen 2
RTNN
North Carolina State University
NCSU Nanofabrication Lab (NNF)
- Thin Film Processing
- Dielectric
- ALD
Description
The Ultratech Fiji 200Gen 2 Plasma ALD system has four precursor locations and four gas lines into the system for depositions. This instrument is a modular, high-vacuum system that accommodates a wide range of deposition modes.