ASML 300C DUV Stepper
ASML 300C DUV Stepper
ASML - 300C
CNF
Cornell University
Cornell NanoScale Science & Technology Facility (CNF)
- Lithography
- All Lithography
- DUV
Description
The ASML 300C DUV stepper uses a KrF excimer laser to expose features as small as 0.2 micrometers with layer-to-layer registration better than 45 nanometers.
Maximum Substrate Size
8 inch