Arradiance ALD

The Arradiance Gemstar-6 ALD system is a benchtop system capable of depositing highly conformal and uniform dielectric and metal thin films. The films are deposited with thermal ALD processes. The system can also be used for depositing on partlices. This system is solely configured for thermal ALD and presently has precursors for Al, Ti, Pt, Si, and Zr. The system also has an ozone generator which allows films to be deposited at lower temperatures. It is uniquely configured for ALD of nanoparticles in either a static or rotational mode. The following films can be deposited: Pt, SiO2, Al2O3, TiO2, TiN, and ZrO2.