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Applied Materials P5000 Etcher

Applied Materials P5000 Etcher

Applied Materials - P5000

nano@stanford Stanford University Stanford Nanofabrication Facility
  • Etching
    • Dry
      • RIE
Description
The Applied Materials Precision 5000 Etcher is a "cluster" tool, consisting of four, independently-controlled etch chamber modules which surround a central loadlock. Chambers A, B, and C are Magnetically-Enhanced Reactive Ion Etch (MERIE) systems, each equipped with optical endpoint detection to allow for more customized etching. The chamber configuration and system software allow control over a wide range of process parameters.
Maximum Substrate Size
4 inch
Comments
MRIE system with three chambers (metal, dielectric, and poly etching)
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