Applied Materials P5000 Etcher
Applied Materials P5000 Etcher
Applied Materials - P5000
nano@stanford
Stanford University
Stanford Nanofabrication Facility
- Etching
- Dry
- RIE
Description
The Applied Materials Precision 5000 Etcher is a "cluster" tool, consisting of four, independently-controlled etch chamber modules which surround a central loadlock. Chambers A, B, and C are Magnetically-Enhanced Reactive Ion Etch (MERIE) systems, each equipped with optical endpoint detection to allow for more customized etching. The chamber configuration and system software allow control over a wide range of process parameters.
Maximum Substrate Size
4 inch
Comments
MRIE system with three chambers (metal, dielectric, and poly etching)