Anatech Barrel Plasma System
Anatech Barrel Plasma System
Anatech LTD - SCE 160
CNS
Harvard University
Center for Nanoscale Systems (CNS)
- Etching
- Dry
- RIE
Description
The Anatech 106 oxygen plasma barrel asher is a useful tool for quickly removing thin layers of organic contamination. It is useful as a final clean after a wet-chemical photoresist removal, or as a _de-scum_ process before a deposition process. The tool can accommodate up to 150 mm diameter substrates. The tool is nearly completely automated, with a touch-screen control panel. Maximum RF power is 300 watts, maximum O2 flow rate of 100 SCCM.
Comments
Training is offered most weeks, in conjunction with training on the technics plasma system. Sign up is on the online training webpage.