AllWin 610 Rapid Thermal Annealer
AllWin 610 Rapid Thermal Annealer
AllwiG Associates - Allwin 610
nano@stanford
Stanford University
Stanford Nanofabrication Facility
- Thin Film Processing
- Dielectric
- RTA/RTP
Description
The aw610 systems are rapid thermal processing (RTP) systems, which use high intensity visible radiation to heat single wafers for short process periods of time at precisely controlled temperatures.
Maximum Substrate Size
6 inch