AJA International Sputtering System

AJA International magnetron sputtering sources, 2" and larger, feature the unique modular magnet array allowing the end user to configure the source to operate in the balanced, unbalanced, and magnetic material modes depending on the application. All AJA UHV sources feature rare earth magnets which are bake-able to 200°C without magnet removal and are vacuum compatible to 10-11 Torr. AJA International magnetron sputtering sources fitted with either manual or in-situ tilt gimbals are capable of achieving extremely high levels of deposition uniformity when depositing onto a rotating substrate holder with adjustable working distance. Typically, +I- 2% thickness uniformity is easily achieved with better than +/-1% uniformity being possible in certain arrangements. AJA International magnetron sputtering sources locate the rare earth magnet array very close to the back of the target thus allowing low pressure operation in the 10-4 Torr range. 2" sources will operate down to 7 x 10-4 Torr while 3" and 4" sources will operate down to 3 x 10-4 Torr (with adequate pumping). The substrate holder accommodates substrates up to 156mm x 156mm, mounts to top of chamber for sputter up orientation, UHV construction, confocal configuration on vertical center axis of chamber, continuous motorized rotation (0- 20RPM) with controller, radiant heating to 800°C with quartz halogen lamps, water cooled reflector box, capable of being heated in an 02 environment, SHQ-25A PID controller with TC input, overtemp protection, +I- 1°C temp. stability, (1) transferable substrate carrier, 3" working distance adjustment via edge welded , motorized UHV bellows (6" CF flange size), substrate gas distributor, RFIDC biasing capability while rotating I heating I depositing, and AJA International 300 Watt RF generator, manual matching network and cable set.