AJA ATC Orion 8 UHV Sputtering System
AJA ATC Orion 8 UHV Sputtering System
AJA International Inc - ATC-Orion 8
SHyNE Resource
The University of Chicago
Pritzker Nanofabrication Facility (PNF)
- Thin Film Processing
- Metal
- Sputter
Description
PVD tool which deposits films on a substrate using magnetron sputtering. Magnetron sputtering uses accelerated, positively charged ions from a plasma source to deposit films with an increased deposition rate and more controlled election bombardment than evident in other sputtering systems (such as diode sputtering).
Maximum Substrate Size
6 inch