ABM Contact Aligner
ABM Contact Aligner
ABM
CNF
Cornell University
Cornell NanoScale Science & Technology Facility (CNF)
- Lithography
- All Lithography
- UV
Description
The ABM High Resolution Mask Aligner is a very versatile instrument with interchangeable light sources which allow Near-UV (405-365 nm) as well as Mid-and Deep-UV (254 nm, 220 nm) exposures in proximity (non-contact) or contact (soft & hard) modes.
Maximum Substrate Size
6 inch