790 Plasmatherm #1 RIE
790 Plasmatherm #1 RIE
PlasmaTherm/Unaxis/Oerlikon - 790
TNF
University of Texas at Austin
Microelectronics Research Center (MRC)
- Etching
- Dry
- RIE
Description
CF4, BCI3, SiCI4, O2, CH4, SF6, H2, Ar; RIE reactor for III-V based materials.
Maximum Substrate Size
6 inch