LPCVD TEOS Oxide- Bank C-3
LPCVD TEOS Oxide- Bank C-3
MRL - Cyclone
CNF
Cornell University
Cornell NanoScale Science & Technology Facility (CNF)
- Thin Film Processing
- Dielectric
- CVD
Description
CVD of silicon dioxide using TEOS source
Restrictions
Silicon only
Maximum Substrate Size
6 inch