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JEOL Electron Beam Lithography

JEOL Electron Beam Lithography

JEOL - JBX-6000 FS/E

ASU EBL
NCI-SW Arizona State University ASU NanoFab
Lithography All Lithography EBL
Description
Electron beam lithography
Maximum Substrate Size
8 inch
Comments
20 nm resolution, 60 nm overlay
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